Wafer photoresist silicon wafer baking machine heating plate

Wafer photoresist silicon wafer baking machine heating plate, super infrared radiation, no mechanical heating components, dry burning, no electromagnetic field interference and harm,

-ultra-fast heating technology can make the temperature 5°C per second The speed increases, the board surface temperature is uniform, the temperature is within 100℃, the accuracy is 0.1~0.5°C, the accuracy is within 200℃, the accuracy is 1℃,
-LED display, temperature can be set, built-in temperature probe and external temperature probe, free Switch.
-Over-temperature alarm function, set the temperature timer function, the experiment is more convenient
-Nano ceramic spraying seamless heating plate surface, flat;

Wafer photoresist silicon wafer baking machine heating plate

Wafer photoresist silicon wafer baking machine heating plate

HMS-901 A S

Product Description:

- using NanoHeat world level heat technology-driven, super infrared radiation, no mechanical heating element can be dry, no electromagnetic interference and harm,

- ultra-fast heating technology allows second temperature 5 ° C the speed is increased, a uniform plate surface temperature, temperature of 100 or less ℃, accuracy of 0.1 ~ 0.5 [deg.] C , 200 is less ℃, accuracy . 1 ℃,

-LED display, temperature can be set , built-in temperature probe and external temperature probe, can be switched freely.

-Over -temperature alarm function, set the temperature timer function, the experiment is more convenient

- nano-ceramic coating seamless heating plate surface, flatness, acid, alkali, corrosion resistance, no cross-contamination, easy to clean.

-With a heat preservation cover, the entire heating area forms a heat preservation cavity, which greatly improves the temperature uniformity and also plays a role of dust prevention;

-The machine can choose to have a negative pressure function, with a number of adsorption holes on the surface, so that the heated material can be closely attached to the surface of the heating plate to achieve a uniform heating effect;

- against magnetic interference and danger: making the best choice for medical and laboratory use

- applicable to most containers: glass, ceramic, and metal containers

- widely used in industrial heating experiments, semiconductor electronics, agricultural, chemical, pharmaceutical, biological, preparing an new materials and the like.

Product features :

Enhanced infrared heating technology

Over-temperature protection function, over-temperature alarm function, timing function, have obtained CE certification, the experiment is safer and more convenient! !

Heating output power: 1000 W

Panel temperature control: room temperature ～300 ℃

Temperature control mode: LED digital display temperature freely set

Temperature test: Built-in temperature control and external temperature control can be switched

Temperature control accuracy: ±0.1~ 0.5 ℃

Working size: 240×240mm

Heating zone: 220×220mm

Product dimensions: 360×270×100mm

Panel material: Nano ceramic coating heating panel

It can choose to have a negative pressure function, and the surface is provided with a number of adsorption holes, which can make the heated material closely adhere to the surface, so as to achieve a uniform heating effect.

With a heat preservation cover, the entire heating zone forms a heat preservation cavity, which greatly improves the temperature uniformity and also plays a role of dust prevention;